MgO (111) Substrate 10x10 x0.5 mm, 2SP - MGc101005S2 InAs Wafer Size: 2" dia x

Wafer Size:                    2" dia x  450 microns

It can be pressed tightly by two layers of high-elastic film and suspended in the middle of the carrier

The crystallographic orientation of silicon is 100

Size:        4"  dia

Size:                        10x10x1

MgO (111) Substrate 10x10 x0.5 mm, 2SP - MGc101005S2 InAs Wafer Size: 2" dia xSpecifications of MgO substrate Size: 10x10 x 0. 5mm + 0. 05 mm Orientation: (111) + 0. 5 Deg Polish: two sides optical polished. Surface finish (RMS or Ra): < 15A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature cooling. It is difficult to get uniform perfect crystal