Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 Features High precision cutting for

Features High precision cutting for hard and brittle nonmetal materials such as Si

Polished:       two side polished

Atomic Weight:      26

2 sides polished

2% Package shipped in a vacuum bag Warning Consumable items are not returnable

Al2O3- Sapphire Wafer, R Plane, 10x10x1.0mm, 2SP Orientation 110 Features High precision cutting forFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 10 mm x 10 mm x 1. 0 mm thick Orientation tolerance: <1 102> + 0. 5 o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A Two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade