99. 9% Density: 4. 506 g cm3 Melting Point: 1668C Size: 1"x1"x0. 5 mm, Surface finish : One side polished Application: substrates for metal, alloy film and biological materials Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 99. 9% Density: 4. 506 g cm3 Melting Point: 1668C Size: 1"x1"x0. 5 mm, Surface finish : One side polished Application: substrates for metal, alloy film and biological materials Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 99. 9% Density: 4. 506 g cm3 Melting Point: 1668C Size: 1"x1"x0. 5 mm, Surface finish : One side polished Application: substrates for metal, alloy film and biological materials Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> Titanium (Ti) Metallic Substrate: 1"x1"x0.5 mm, 1side polished - mcTi252505S1 FTO Film Coated Glass Carbon coating layer improves Li – fit7alimentos.com.br

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Titanium (Ti) Metallic Substrate: 1"x1"x0.5 mm, 1side polished - mcTi252505S1 FTO Film Coated Glass Carbon coating layer improves Li

$118.38

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Description

Carbon coating layer improves Li intercalation/deintercalation stability

D ) for any dicing saw with 0

Conductive type:      Undoped

Resistant to molten metal sparks and splashes

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Titanium (Ti) Metallic Substrate: 1"x1"x0.5 mm, 1side polished - mcTi252505S1 FTO Film Coated Glass Carbon coating layer improves LiPolycrystal Ti metallic substrate Purity: > 99. 9% Density: 4. 506 g cm3 Melting Point: 1668C Size: 1"x1"x0. 5 mm, Surface finish : One side polished Application: substrates for metal, alloy film and biological materials Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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