Al2O3- Sapphire Wafer, C-plane (0001), 10x10x0.5mm, 2 SP - ALC101005S2 Mo-Coated Sodalime Glass Panel cutout:

Panel cutout:

Abrade and clean surface for best results

This jig features a built-in retaining mechanism that prevents the loss of compression force on the split cell

Installation of Mosi2 Heating Element

Surface Density: 800g/m^2 Length:  200 mm

Al2O3- Sapphire Wafer, C-plane (0001), 10x10x0.5mm, 2 SP - ALC101005S2 Mo-Coated Sodalime Glass Panel cutout:Features: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 10 x 10 x 0. 5 mm thick Orientation: <0001> + 0. 5o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A 2 sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with