M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current SEMI E116-0706 (technical revision)

SEMI E116-0706 (technical revision)

These defects are influenced directly by contamination

This Standard covers only load ports for reticle SMIF pods (RSPs) as specified in SEMI E100

1  Some terms are specialized to a semiconductor manufacturing environment

can be used to facilitate inclusion of such additional physical properties and suitable test methods as may be required in the Specification

M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current SEMI E116-0706 (technical revision)This Guide provides a framework for reporting of nanotopography surface features on silicon wafers. This Guide addresses reporting the characterization of nanotopography surface features found on wafer surfaces. Nanotopography is the non planar deviation of the whole front wafer surface within a spatial wavelength range of approximately 0. 2 to 20 mm and within the fixed quality area (FQA). Typical examples include dips, bumps or waves on the wafer