C10400 - SEMI C104 - Guide for Reporting Performance Parameters of the Polymer Windows for Chemical Mechanical Planarization (CMP) Pads Used in Semiconductor Manufacturing Revision:SEMI C104-0622 - Current Identify key types of ceramics

Identify key types of ceramics and composites and their design considerations

or unpolished

F-GHG排出の測定と特性評価

than the current industry process of record (POR) shore hardness (SH)

This Document doesn’t specify the methodology or algorithm to estimate or foretell the lifetime of parts and components

C10400 - SEMI C104 - Guide for Reporting Performance Parameters of the Polymer Windows for Chemical Mechanical Planarization (CMP) Pads Used in Semiconductor Manufacturing Revision:SEMI C104-0622 - Current Identify key types of ceramicsThis Guide provides directions for measurements and reporting the parameters of chemical mechanical planarization (CMP) pad windows. This Guide provides directions for reporting metrology tools used to measure parameters of the CMP pad windows. This Guide provides the list of the parameters for CMP pad windows required to measure and report on quality documents. Reference to this Guide can be used in the quality documents (i. e., in the technical data