E11600 - SEMI E116 - 装置性能トラッキング（EPT）のための仕様 Revision:SEMI E116-0707E - Superseded and limits of variation

and limits of variation

The specified cast silicon wafer includes cast silicon category I wafer and cast silicon category II wafer

SEMI E10-86 (first published)

and Safety Guideline for Exhaust Ventilation of Semiconductor Manufacturing EquipmentSEMI S7 — Safety Guideline for Evaluating Personnel and Evaluating Company QualificationsSEMI S8 — Safety Guideline for Ergonomics Engineering of Semiconductor Manufacturing EquipmentSEMI S10 — Safety Guideline for Risk Assessment and Risk Evaluation ProcessSEMI S12 — Environmental

1が新たに作成されたことを反映して，0307の出版サイクルで更新された。

E11600 - SEMI E116 - 装置性能トラッキング（EPT）のための仕様 Revision:SEMI E116-0707E - Superseded and limits of variationNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI E 20079R1 13 300 mmEPT EPTEPTEPTEPTMES: Manufacturing Execution SystemSEMI E10SEMI E79EPT (EPT: Equipment Performance Tracking) EPT SEMI E10SEMI E58 SEMI E58SEMI E58SEMI E10 SEMI E10SEMI E79SEMI E10SEMI E79EPTSEMI E10SEMI E79EPTSEMI