M03200 - SEMI M32 - 統計的仕様のガイド Revision:SEMI M32-0307 - Superseded SEMI G52-1120 (technical revision)

SEMI G52-1120 (technical revision)

SEMI E115-0302E (editorial revision)

handling and preparation

7 mm（1/2 in）の，半導体業界で使用される機械加工された溶接継手のエルボーとティーに適用される。

54 — Gas Purity Guideline for Silane (SiH4)

M03200 - SEMI M32 - 統計的仕様のガイド Revision:SEMI M32-0307 - Superseded SEMI G52-1120 (technical revision)global Silicon Wafer Committee20061121global Audits and Reviews Subcommittee20072www. semi. org20073CD ROM1998920047 Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M18 Format for Silicon Wafer Specification Form for Order Entry SEMI M57 Guide for Specifying Silicon Annealed Wafers SEMI M59 Terminology for Silicon Technology SEMI M61 Specification for Silicon Epitaxial Wafers with Buried Layers SEMI