MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded SEMI M45 — Provisional Standard

SEMI M45 — Provisional Standard for 300mm Wafer Shipping System

This Standard limits the kinds of activities that may occur near the load face plane of the equipment

The CIE XYZ color space is derived from the experimental results and it has been used to set color performance of displays in CIE xy or u’v’ chromaticity diagram without brightness

SEMI M1-1117 (technical revision)

SEMI MF671-99 (first SEMI publication)

MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded SEMI M45 — Provisional Standard1 Purpose 1. 1 This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Youngs modulus. 2 Scope 2. 1 This Test Method presents a procedure for measuring step heights of thin films using step height test