M04200 - SEMI M42 - Specification for Compound Semiconductor Epitaxial Wafers StdPbc-0317 SEMI 3D10-0814 (Reapproved 1025)

SEMI 3D10-0814 (Reapproved 1025)

4 — 200 mm Standard Mechanical Interface (SMIF)

SEMI E23 — Specification for Cassette Transfer Parallel I/O Interface

Such a kinematic coupling can be used at several interfaces

Such ingots are sliced into wafers that are subsequently used for the production of semiconductor devices

M04200 - SEMI M42 - Specification for Compound Semiconductor Epitaxial Wafers StdPbc-0317 SEMI 3D10-0814 (Reapproved 1025)NOTICE: This Standard was balloted and approved for withdrawal in 2021. Compound semiconductor epitaxial layers have been extensively used for many years as the basis of high speed electronics and optoelectronic devices. There are suppliers of epitaxial layers who will grow material to the customers specification. There is a need to define standardized descriptive terms, tolerance schedules and recommended test methods to reduce ambiguity in the