P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 Revision:SEMI P40-1103 - Superseded Topic & Readings

Topic & Readings

This terminology is applicable for use in connection with research

This Specification also provides a tabular specification format for order entry so that relevant non-standardized wafer characteristics and extensions of wafer sizes for research

SEMI G75-0698 (Reapproved 0615)

commonly called metric) units shall be used

P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 Revision:SEMI P40-1103 - Superseded Topic & ReadingsGlobal Micropatterning CommitteeNorth American Micropatterning Committee200393North American Regional Standards Committee20039www. semi. org200311 EUVL Referenced SEMI Standards SEMI P37 Specification for Extreme Ultraviolet Lithography Mask Substrates SEMI P38 Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks