P01400 - SEMI P14 - Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy StdTpc-Leadframes

P01400 - SEMI P14 - Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy StdTpc-LeadframesNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This procedure is a graphite furnace atomic absorption analytical method for tin in photoresist. The applicable concentration range is 0. 1 to 1 ppm when the sample is diluted one to ten. The precision was found to be

orgで入手可能となる。初版は2001年発行。前版は2006年11月発行。

and so forth) are dealt with by other SEMI Standards

this Safety Guideline may be used to evaluate subsystems to determine if integrating them into a PLHS will cause the PLHS not to conform to this Safety Guideline

originally published in 1996

This Specification focuses on panel (largest external) dimensions (with or without process carrier)

SEMI M54-0319 (technical revision)

and the areas needed for maintenance and service

SEMI MF1366-02 (first SEMI publication)

and electrical properties of leadframe tape

雖然本基準是以評估工具的角度撰寫，但也適用在半導體製造設備的設計與開發時所採用之工具。

and Message Services

This Practice describes conversions between dopant density and resistivity for arsenic-